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The effect of chelating reagents on the layer-by-layer formation of CdS films in the electroless and electrochemical deposition processes
http://hdl.handle.net/10649/00000973
http://hdl.handle.net/10649/00000973191f9cd7-c2cb-4188-b9d7-5f7218cc60fa
| 名前 / ファイル | ライセンス | アクション |
|---|---|---|
ECA48-483Silar (115.5 kB)
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| アイテムタイプ | 学術雑誌論文 / Journal Article(1) | |||||
|---|---|---|---|---|---|---|
| 公開日 | 2019-02-28 | |||||
| タイトル | ||||||
| タイトル | The effect of chelating reagents on the layer-by-layer formation of CdS films in the electroless and electrochemical deposition processes | |||||
| 言語 | ||||||
| 言語 | eng | |||||
| キーワード | ||||||
| 主題Scheme | Other | |||||
| 主題 | CdS | |||||
| キーワード | ||||||
| 主題Scheme | Other | |||||
| 主題 | atomic layer deposition | |||||
| キーワード | ||||||
| 主題Scheme | Other | |||||
| 主題 | triethanolamine | |||||
| キーワード | ||||||
| 主題Scheme | Other | |||||
| 主題 | cysteine | |||||
| キーワード | ||||||
| 主題Scheme | Other | |||||
| 主題 | stripping voltammetry | |||||
| 資源タイプ | ||||||
| 資源タイプ識別子 | http://purl.org/coar/resource_type/c_6501 | |||||
| 資源タイプ | journal article | |||||
| 著者 |
Sasagawa, Mariko
× Sasagawa, Mariko× Nosaka, Yoshio |
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| 著者所属 | ||||||
| 値 | 長岡技術科学大学工学研究科エネルギー・環境工学専攻 | |||||
| 著者所属 | ||||||
| 値 | 長岡技術科学大学化学系 | |||||
| 抄録 | ||||||
| 内容記述タイプ | Abstract | |||||
| 内容記述 | Triethanolamine (TEOA) and cysteine (Cys) were examined fur the effect of chelating reagents to deposit CdS thin films by means of two different processes. Those are the successive ionic layer adsorption and reaction (SILAR) method and the successive under potential deposition (UPD) method, in which Cd and S are separately deposited on a polycrystalline Au substrate from each solution. Evaluation by stripping voltammetry showed that the amount of the deposited CdS was increased for 1, 3, 5, 7, and 10 layers of CdS prepared by these methods. It was found that, with the SILAR method, the order of the ability to increase CdS depositiun was Cys>TEOA>None. On the other hand, with the successive UPD method, the order was None≥TEOA>Cys, showing a certain inhibition in the electrochemical deposition process. It is concluded that CdS deposition by the SILAR method becomes compatible to the successive UPD when a suitable chelating reagent was added to the Cd solution. | |||||
| 書誌情報 |
Electrochimica Acta 巻 48, 号 5, p. 483-488, 発行日 2003 |
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| ISSN | ||||||
| 収録物識別子タイプ | ISSN | |||||
| 収録物識別子 | 0013-4686 | |||||
| 著者版フラグ | ||||||
| 出版タイプ | AM | |||||
| 出版タイプResource | http://purl.org/coar/version/c_ab4af688f83e57aa | |||||
| 出版者 | ||||||
| 出版者 | Elsevier | |||||
| 資源タイプ | ||||||
| 内容記述タイプ | Other | |||||
| 内容記述 | Article | |||||
| URI | ||||||
| 識別子 | https://doi.org/10.1016/S0013-4686(02)00714-4 | |||||
| 識別子タイプ | DOI | |||||
